JPH0362790B2 - - Google Patents

Info

Publication number
JPH0362790B2
JPH0362790B2 JP58059725A JP5972583A JPH0362790B2 JP H0362790 B2 JPH0362790 B2 JP H0362790B2 JP 58059725 A JP58059725 A JP 58059725A JP 5972583 A JP5972583 A JP 5972583A JP H0362790 B2 JPH0362790 B2 JP H0362790B2
Authority
JP
Japan
Prior art keywords
flow rate
gas
carrier gas
concentration
metal compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58059725A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59185772A (ja
Inventor
Isamu Komya
Masaru Izumida
Michio Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON TYLAN KK
Original Assignee
NIPPON TYLAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON TYLAN KK filed Critical NIPPON TYLAN KK
Priority to JP5972583A priority Critical patent/JPS59185772A/ja
Publication of JPS59185772A publication Critical patent/JPS59185772A/ja
Publication of JPH0362790B2 publication Critical patent/JPH0362790B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP5972583A 1983-04-05 1983-04-05 高融点金属化合物における蒸発ガスの流量制御装置 Granted JPS59185772A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5972583A JPS59185772A (ja) 1983-04-05 1983-04-05 高融点金属化合物における蒸発ガスの流量制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5972583A JPS59185772A (ja) 1983-04-05 1983-04-05 高融点金属化合物における蒸発ガスの流量制御装置

Publications (2)

Publication Number Publication Date
JPS59185772A JPS59185772A (ja) 1984-10-22
JPH0362790B2 true JPH0362790B2 (en]) 1991-09-27

Family

ID=13121460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5972583A Granted JPS59185772A (ja) 1983-04-05 1983-04-05 高融点金属化合物における蒸発ガスの流量制御装置

Country Status (1)

Country Link
JP (1) JPS59185772A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60102251U (ja) * 1983-12-14 1985-07-12 日本電気株式会社 気相成長装置
JPS6191301U (en]) * 1984-11-17 1986-06-13
EP0382987A1 (en) * 1989-02-13 1990-08-22 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Gas supplying apparatus
US6899223B2 (en) 2002-05-09 2005-05-31 Bert-Co Industries, Inc. Form for a package and method of making same
US6802419B2 (en) 2002-10-11 2004-10-12 Bert Co Industries, Inc. Package form and method of making a package

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS537169Y2 (en]) * 1974-06-24 1978-02-23

Also Published As

Publication number Publication date
JPS59185772A (ja) 1984-10-22

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